Technology
Sputtering (ionic erosion)"Sputtering" is a vacuum process used to apply very thin films to miscellaneous substrates. This process is used both for scientific and commercial purposes. This process involves applying an electrical field to a low pressure gas (generally argon at 5e-3 mBar) to transform the gas into plasma (ionised gas state – mixture of electrons, ions and inert gas). |
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Sputtering has two main advantages:
- Sputtering creates very thin films (a few atomic layers) and the most even films possible at the current time. These properties are achieved thanks to the atom-by-atom growth of the coating in the presence of an energetic plasma.
- Sputtering can be used for a wide range of materials (metals, alloys, oxides, nitrides, etc.). Potential for development is therefore extensive (far greater than many other current techniques).
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